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LAMP ANNEAL APPARATUS

IP.com Disclosure Number: IPCOM000005638D
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2001-Oct-23
Document File: 1 page(s) / 58K

Publishing Venue

Motorola

Related People

Kazuo Toda: AUTHOR

Abstract

The lamp anneal apparatus of Fig. 1 is designed to provide high throughput annealing. The apparatus of Fig. 1 comprises a plurality of batch-type lamp anneal rooms. Wafers are input one by one to each of quartz chamber units and output therefrom after one revolution.

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MOlOROLA Technical Developments Volume 7 October 1997

LAMP ANNEAL APPARATUS

by Kazuo Toda

   The lamp anneal apparatus of Fig. 1 is designed to provide high throughput annealing. The apparatus of Fig. 1 comprises a plurality of batch-type lamp anneal rooms. Wafers are input one by one to each of quartz chamber units and output therefrom after one revolution.

   Each of the quartz chamber units comprises, as shown in Fig. 2, lamps such as halogen lamps and reflec- tors, thereby enabling uniform heating of a wafer. The revolution speed of the chamber units can be varied so that annealing time can be controlled. In a conventional apparatus having one chamber, only one wafer can be input into the chamber at the same time. Therefore, if the treatment of each wafer takes much time, it is necessary for the next wafer to wait a long time, thereby decreasing the process speed. However, the apparatus of Fig. 1 can solve such problems of the conventional apparatus. Also, in the apparatus of Fig. 1, it is possible to control the output power and time of lamps of each chamber unit as well as the revolution speed of the chamber units. Therefore, the anneal condition can be controlled independently for each wafer.

   In an apparatus on which, for example, ten wafers can be loaded, if the heating time is four minutes and the revolution time is also four minutes per each revolution, it is possible to treat 150 wafers per hour. This is a large enough handling ability even when compared...