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Browse Prior Art Database

SOLDER BUMPS AND ELECTROPLATED INDUCTORS ON THE SAME DIE

IP.com Disclosure Number: IPCOM000007834D
Original Publication Date: 1996-Aug-01
Included in the Prior Art Database: 2002-Apr-29
Document File: 1 page(s) / 48K

Publishing Venue

Motorola

Related People

Pete East: AUTHOR [+3]

Abstract

To date we have been processing wafers with solder bumps for flip chip applications and have developed a process for manufacturing planar, spiral copper inductors for RF applications. The purpose of this disclosure is to describe the process for implementing these two structures on the same die, thus allowing for flip chip of die with the spiral induc- A) Process 1 1) sputter Ti-W and Cu 2) spin resist 3) Photolithography for the inductors and bump pedestals 4) Electroplate the Cu inductors and bump pedestals 5) Strip the resist 6) Etch the excess Cu bus metal 7) Spin resist 8) Photolithography to complete the solder bumps 9) Complete electroplating of the rest of the Cu portion ofthe bump 10) Electroplate the solder onto the Cu bump 11) Strip the resist 12) Etch the excess Ti-W bus metal 13) Reflow the solder tors. The potential applications would be in any RF application including pagers and cellular phones.

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Technical Developments

SOLDER BUMPS AND ELECTROPLATED INDUCTORS ON THE SAME DIE

by Pete East, Bill Marlin and Michael Pfeifer

  To date we have been processing wafers with solder bumps for flip chip applications and have developed a process for manufacturing planar, spiral copper inductors for RF applications. The purpose of this disclosure is to describe the process for implementing these two structures on the same die, thus allowing for flip chip of die with the spiral induc-

A) Process 1
1) sputter Ti-W and Cu
2) spin resist
3) Photolithography for the inductors and bump pedestals
4) Electroplate the Cu inductors and bump pedestals
5) Strip the resist
6) Etch the excess Cu bus metal
7) Spin resist
8) Photolithography to complete the solder bumps
9) Complete electroplating of the rest of the Cu portion ofthe bump
10) Electroplate the solder onto the Cu bump
11) Strip the resist
12) Etch the excess Ti-W bus metal
13) Reflow the solder

tors. The potential applications would be in any RF application including pagers and cellular phones.

  Currently, we have two processes for electroplat- ing solder bumps and inductors onto a wafer. These are as follows:

B) Process 2
1) Sputter Ti-W and Cu
2) Spin resist
3) Photolithography for the inductors
4) Electroplate the Cu inductors
5) Strip the resist
6) Spin resist
7) Photolithography for the solder bumps
8) Electroplate the Cu portion of the bump
9) Electroplate the solder onto the Cu bump
10) Strip the resist
11) Etch the e...