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ABATEMENT OF HYDRIDE GASES FROM THE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION PROCESSES

IP.com Disclosure Number: IPCOM000008053D
Original Publication Date: 1997-Mar-01
Included in the Prior Art Database: 2002-May-15
Document File: 1 page(s) / 69K

Publishing Venue

Motorola

Related People

Dave Innmon: AUTHOR [+3]

Abstract

The apparatus and methodology presented here- in is applicable to all atmospheric pressure chemical vapor deposition equipment. In this article, the apparatus for improving the process operational sta- bility and exhaust abatement is discussed.

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MOTOROLA Technical Developments

ABATEMENT OF HYDRIDE GASES FROM THE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION PROCESSES

by Dave Innmon, Hsi-An Kwong and Don Shams

ABSTRACT

  The apparatus and methodology presented here- in is applicable to all atmospheric pressure chemical vapor deposition equipment. In this article, the apparatus for improving the process operational sta- bility and exhaust abatement is discussed.

STATEMENT OF PROBLEM

  The exhaust from the atmospheric pressure chemical vapor deposition (APCVD) processes of semiconductor plants contains phosphine, silane, diborane, nitrogen, oxygen, and particulates consist- ing primarily of silicon oxide and less components of oxides such as boron oxide and phosphorus oxide. The exhaust from the APCVD process is nor- mally vented through the plant exhaust system. The particulates generated form the process often pose maintenance and safety problems in the plant exhaust system. In addition, the unreacted hydride gases such as phosphine and diborane also pose an environmental problem as they are released to the atmosphere with no or little abatement.

  The concerns of installing additional equipment for better collection of the oxide particulates and abatement of the hydride gases have been the ability of maintaining stable pressure control in the exhaust system so that the exhaust fluctuations to the APCVD reactor chamber can be minimized. However, the plant exhaust connected to the

APCVD system does not norma...