Browse Prior Art Database

4500I PADDLE ALIGNMENT TOOL

IP.com Disclosure Number: IPCOM000008455D
Original Publication Date: 1997-Dec-01
Included in the Prior Art Database: 2002-Jun-17
Document File: 2 page(s) / 92K

Publishing Venue

Motorola

Related People

Tony Hajek: AUTHOR

Abstract

There has been a problem with Lam Research's 45001 Etcher burning the resist on wafers due to the improper height alignment of the heated paddle in the isotropic chamber. Lam Research used three plastic disk and a razor blade placed on one disk located underneath the paddle to set the alignment height which, depending on the person setting, was inconsistent. There was many inconsistencies in the procedure and the person doing the alignment which caused a high level of scrapped wafers due to burning resist and causing additional equipment down time.

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MOTOROLA Technical Developments

45001 PADDLE ALIGNMENT TOOL

by Tony Hajek

  There has been a problem with Lam Research's 45001 Etcher burning the resist on wafers due to the improper height alignment of the heated paddle in the isotropic chamber. Lam Research used three plastic disk and a razor blade placed on one disk located underneath the paddle to set the alignment height which, depending on the person setting, was inconsistent. There was many inconsistencies in the procedure and the person doing the alignment which caused a high level of scrapped wafers due to burning resist and causing additional equipment down time.

  As shown in Figure 1, a tool was created that included an aluminum disk device that was machined to the proper pitch from the front to the back. The tool can slide underneath the paddle while still attached in place. Also, the wafer place- ment arm housing is used as a guide for proper placement of the alignment tool. Once the paddle alignment is completed, the tool is removed easily by sliding it out of the front of the tool.

Fig. 1 Top View

0 Motorola, 1°C. ,997 113 December 1997

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MOTOROLA Technical Developments

  The following is the description of the paddle from the top view Figure I and side view Figure 2. From the top view, the device is circular at two ends with straight sides on the left and right. The overall length is 9 inches, the overall width is 6.65 inches, and there is a 1 inch tab at one end for handling the device. The device has a taper of 0.023 inches from the tab to the opposite end of tool to establish the proper angle for the heated paddle to be positioned when the wafer is placed on the paddle in the isotropic chamber. This prevents the secondary plasma from burning the resist due to...