Browse Prior Art Database

Method And Apparatus Of Wafer Print Simulation Using Hybrid Model With Mask Optical Images

IP.com Disclosure Number: IPCOM000011786D
Publication Date: 2003-Mar-14
Document File: 5 page(s) / 65K

Publishing Venue

The IP.com Prior Art Database

Abstract

A simulation tool can generate a simulated wafer image having the accuracy of a photoresist model with the speed of an optical model by using a threshold look up table. In one embodiment, the threshold look up table could include variables such as feature size, pitch size, feature type, and defect type.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 5

[This page contains 3 pictures or other non-text objects]

Page 2 of 5

[This page contains 3 pictures or other non-text objects]

Page 3 of 5

[This page contains 3 pictures or other non-text objects]

Page 4 of 5

[This page contains 3 pictures or other non-text objects]

Page 5 of 5

[This page contains 3 pictures or other non-text objects]