Method And Apparatus Of Wafer Print Simulation Using Hybrid Model With Mask Optical Images
Publication Date: 2003-Mar-14
The IP.com Prior Art Database
A simulation tool can generate a simulated wafer image having the accuracy of a photoresist model with the speed of an optical model by using a threshold look up table. In one embodiment, the threshold look up table could include variables such as feature size, pitch size, feature type, and defect type.