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METHOD OF DEPOSITING SI CONTAINING CARDON OVERCOAT

IP.com Disclosure Number: IPCOM000014342D
Original Publication Date: 1999-Dec-01
Included in the Prior Art Database: 2003-Jun-19
Document File: 1 page(s) / 37K

Publishing Venue

IBM

Related People

C HWANG: AUTHOR [+3]

Abstract

A method of fabricating thin film containing Si, hydrogen and carbon is disclosed here. The thin film coating thus obtained combines both physical vapor of Si and chemical vapor of carbon and hydrogen to provide the best step coverage and durability for protective coating applications; in particular the head-disk interface (HDI in a hard disk drive (HDD) where the very thin coating thickness is demanded.

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METHOD OF DEPOSITING SI CONTAINING CARDON OVERCOAT

     A method of fabricating thin film containing Si, hydrogen and carbon is disclosed here. The thin film coating thus obtained combines both physical vapor of Si and chemical vapor of carbon and hydrogen to provide the best step coverage and durability for protective coating applications; in particular the head-disk interface (HDI in a hard disk drive (HDD) where the very thin coating thickness is demanded.

     In order to obtain a good protective coating by vacuum deposition technique, it is important to rely on chemical vapor for step coverage and physical vapor to provide mechanical strength of the coating. It is disclosed that the Si containing carbon overcoat can be obtained by either DC or RF sputtering of a Si target in a mixture of Ar and CH4 gases. The role of Si in the film is to provide adhesion to the under lying substrate and to enhance the mechanical strength of the film. Films deposited using 10% CH4 (balance of Ar) were fabricated. Depending on the sputtering target power levels, the resultant film could contain less than 1% Si to up to 35% Si. The hydrogen concentration is less sensitive to power level and is around 35-40%. The film stress also varies with film composition; higher Si content typically shows higher stress, implying harder films.

     100 Angstrom thick films with four different compositions were tested against contact start stop (CSS) test for durability. Films with little Si show adhesion fa...