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Oxygen plasma cleaning of carbon compound deposition

IP.com Disclosure Number: IPCOM000014444D
Original Publication Date: 2000-Mar-01
Included in the Prior Art Database: 2003-Jun-19
Document File: 1 page(s) / 27K

Publishing Venue

IBM

Abstract

Disclosure is a deposition system or plasma etching system that can remove the deposited carbon or carbon compound films on the camber wall, electrodes, shields, substrate holders or masks by using plasma oxygen. In the system the chamber where the oxygen plasma is glowed for cleaning can be the same or different chamber from the depositing or etching ones.

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Oxygen plasma cleaning of carbon compound deposition

    Disclosure is a deposition system or plasma etching system that can remove the deposited carbon
or carbon compound films on the camber wall, electrodes, shields, substrate holders or masks by using
plasma oxygen. In the system the chamber where the oxygen plasma is glowed for cleaning can be the
same or different chamber from the depositing or etching ones.

    In case of removing the deposited carbon or carbon compound films from the camber wall,
electrodes, shields, substrate holders or masks, it is much easier to use oxygen plasma compare with
a method of removing them in organic or chemical solutions or in a physical way. There is no need to
remove the camber wall, electrodes, shields, substrate holders or masks from the system, and it can
be done in-situ in vacuum. Therefore, maintenance time will be much reduced especially in
manufacturing processes.

    An example of using this system can be parallel electrode systems such as sputtering, CVD
(chemical vapor deposition), plasma etching system, ECR (Electron cyclotron resonance) system, ion
gun, and microwave plasma system. The cleaning can be done by simply introducing oxygen into those
system and create a plasma, and then expose the deposited carbon or carbon compounds parts to the
oxygen plasma.

Examples:
1. In a sputtering tool using carbon targets, carbon or carbon compound films on the camber wall and
shields can be removed by introducing oxygen into the system and create...