Browse Prior Art Database

Element Like ELG device capable of resistance lapping and other forms of performance lapping

IP.com Disclosure Number: IPCOM000015137D
Original Publication Date: 2001-Sep-13
Included in the Prior Art Database: 2003-Jun-20
Document File: 2 page(s) / 203K

Publishing Venue

IBM

Abstract

Disclosed is an ELG device and system capable of resistance lapping and other forms of performance lapping. Typically, GMR products that use current biasing require ELGs to perform resistance lapping. Future GMR products require better stripe height control and better methods of predicting stripe height. Unfortunately, current ELGs are only able to lap to stripe height. Hence, a new element like ELG (ELE) is disclosed that works with preset ELGs to provide additional functions needed for resistance lapping and other forms of improved GMR performance lapping. The following figure shows the preferred arrangement of ELGs and ELEs in every other column. The ELGs in odd columns are the same as current ELGs, having alternating 10 um and 6 um stripe heights, and a wide track width to make them immune to current crowding and non-linear effect in their 1/SH=f(R) relationship. ELEs in the even columns are special ELGs built identical to the GMR elements, with the same track width and alternating stripe heights. Additionally, ELEs have the exact same lead configuration as the GMR product in order to make their resistance identical to the GMR product device. MRH 2

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  Element Like ELG device capable of resistance lapping and other forms of performance lapping

   Disclosed is an ELG device and system capable of resistance lapping and other forms of performance lapping.

   Typically, GMR products that use current biasing require ELGs to perform resistance lapping. Future GMR products require better stripe height control and better methods of predicting stripe height. Unfortunately, current ELGs are only able to lap to stripe height. Hence, a new element like ELG (ELE) is disclosed that works with preset ELGs to provide additional functions needed for resistance lapping and other forms of improved GMR performance lapping.

   The following figure shows the preferred arrangement of ELGs and ELEs in every other column. The ELGs in odd columns are the same as current ELGs, having alternating 10 um and 6 um stripe heights, and a wide track width to make them immune to current crowding and non-linear effect in their 1/SH=f(R) relationship. ELEs in the even columns are special ELGs built identical to the GMR elements, with the same track width and alternating stripe heights. Additionally, ELEs have the exact same lead configuration as the GMR product in order to make their resistance identical to the GMR product device.

MRH = 2

MRH = 4 ELGH = 10.5


Element Like ELG

Element like ELG

Standard ELG

     The new ELE device together with the standard ELG device are capable of the following functions and improvements:

Stripe height lapping

Standard ELG

ELGH...