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DLC Overcoat with Alternating C/Si Multilayer Stacks with High Wear Resistance

IP.com Disclosure Number: IPCOM000015994D
Original Publication Date: 2002-Jul-10
Included in the Prior Art Database: 2003-Jun-21
Document File: 1 page(s) / 49K

Publishing Venue

IBM

Abstract

Some new applications like slider with landing pads require thick, wear resistant and reliable, discretely spaced "bumps". These "bumps" can be made through prior-art lithography methods with deposition of hard coatings. Hard diamond-like carbon (DLC) films are typical candidates for these applications. The existing film structure for this kind of application, usually consists of only one thin silicon underlayer with DLC grown on top of it. The total film thickness is usually in the order of tens of nanometers, and they usually have higher film residual stresses as compared to their thinner film counterpart. The higher internal stresses usually degrade the film adhesion strength by lowering the external load required to delaminate the film, and therefore,causing premature failure of the carbon pads during use. In this invention, we disclose a DLC film with multiple alternating Si/C film stacks. The multiple stacks of thin Si/C films have shown improved residual film stresses, much improved wear resistance and dynamic friction coefficients, while maintaining film hardness.

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DLC Overcoat with Alternating C/Si Multilayer Stacks with High Wear Resistance

Some new applications like slider with landing pads require thick, wear resistant and reliable, discretely spaced "bumps". These "bumps" can be made through prior-art lithography methods with deposition of hard coatings. Hard diamond-like carbon (DLC) films are typical candidates for these applications. The existing film structure for this kind of application, usually consists of only one thin silicon underlayer with DLC grown on top of it. The total film thickness is usually in the order of tens of nanometers, and they usually have higher film residual stresses as compared to their thinner film counterpart. The higher internal stresses usually degrade the film adhesion strength by lowering the external load required to delaminate the film, and therefore,causing premature failure of the carbon pads during use. In this invention, we disclose a DLC film with multiple alternating Si/C film stacks. The multiple stacks of thin Si/C films have shown improved residual film stresses, much improved wear resistance and dynamic friction coefficients, while maintaining film hardness.

Multilayer DLC with alternating Si and DLC layers of repeating 20ASi-20AC stacks (1) reduce film stress,
(2) increase wear resistance and (3) reduce friction coefficients, without degrading much of the film hardness as shown in the attached Table.

Process Hardness, GPa Stress, GPa Wear Endurance*

(Sliding Distance,


m)

Friction Coefficient*

Single-Layer...