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Method for the reduction of CDs during fabrication processing using an electron beam with image recognition software

IP.com Disclosure Number: IPCOM000020728D
Publication Date: 2003-Dec-10
Document File: 2 page(s) / 79K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for reduction of critical dimensions (CDs) during fabrication processing using an electron beam with image recognition software. Benefits include improved device functionality.

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Method for the reduction of CDs during fabrication processing using an electron beam with image recognition software

Disclosed is a method for reduction of critical dimensions (CDs) during fabrication processing using an electron beam with image recognition software. Benefits include improved device functionality.

Background

Critical dimensions have become smaller than can be printed using conventional lithographic techniques. This problem is conventionally addressed by using innovative masks and novel proprietary techniques for CD reduction. Advanced masks use different materials to alter light to the dimensions required for printing.

Description

The disclosed method uses an electron beam and image recognition software to reduce critical dimensions during wafer processing. The electron beam may be part of an existing scanning electron microscope (SEM) used to check critical dimensions or in a stand-alone system dedicated to this technique. In this process, the beam strength and exposure time to the area of interest are varied to fine tune the conditions for optimal reduction of the dimensions. With the SEM’s imaging capability, wafer mapping can be used to target a particular region or transistors. The electron beam scans across an entire wafer or across a preidentified area using a mapping system with coordinates (through image recognition). The SEM system would run through an algorithm to identify the required beam strength to get the necessary shrinkage in the resist. The beam reduces the resist material in size, reducing the printed dimensions. If targeting was done at a particular region of interest, then the system would again scan the region of interest to insure the...