Browse Prior Art Database

MASK IMAGING PROCESSES

IP.com Disclosure Number: IPCOM000023084D
Original Publication Date: 1976-Aug-31
Included in the Prior Art Database: 2004-Mar-27
Document File: 2 page(s) / 196K

Publishing Venue

Xerox Disclosure Journal

Abstract

A high photosensitive imaging system is provided to provide a mask pattern through which a photomechanical image conversion can then be applied to transmit the image of the mask onto a suitably sensitized medium which may be the final output or which may be utilized as a master to prepare multiple final copies.

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XEROX DISCLOSURE JOURNAL

~

MASK IMAGI~TG PROCESSES Proposed Classification
S. L. Gaudioso U.S. Cl, 96/1
mt. Cl. G03g

A high photosensitive imaging system is provided to
provide a mask pattern through which a photomechanical
image conversion can then be applied to transmit the

image of the mask onto a suitably sensitized medium
which may be the final output or which may be utilized
as a master to prepare multiple final copies.

U.V., visible and near infrared light may be employed
providing that suitable reflection and transmission

contrast characteristics are present in the mask, The
latter condition may be satisfied over a wide range
of wavelengths by an appropriate choice of materials

for the opaque and transparent regions of the mask.

Also, because the mask can be prepared by laser scanning
means, it is possible to generate either a positive or
a negative mask merely by selecting the laser exposure

sense to correspond to non~image or image area exposure,

By employing a suitable thermal (or infrared) reflector
such as a vapor deposited metal layer on a transmitting

substrate, relief image printing plates can be prepared
with materials which undergo thermal crosslinking or
similar conversion processes, including melting, thermal~

hardening, etc.

Volume 1 Number 8 August 1976 5

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