Browse Prior Art Database

ANTHRACENE-POLYMER BASED PHOTO-RESISTS

IP.com Disclosure Number: IPCOM000023243D
Original Publication Date: 1977-Apr-30
Included in the Prior Art Database: 2004-Mar-29
Document File: 2 page(s) / 161K

Publishing Venue

Xerox Disclosure Journal

Abstract

The light-induced dimerization in anthracene containing poly-mers is accompanied by changes in the solubility of the materials. Since the photodimerization involves not only neighboring anthracene groups in the same rnacromolecule but also the groups from different macromolecules, the originally soluble polymer or copolymer becomes crosslinked and insoluble upon exposure to activating radiation. This effect can be exploited to prepare photoresists which may be utilized in common photoresist and printing processes. In operation the photoresist is imagewise irradiated, developed with a solvent and then treated as in other common printing and photoresist processes.

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XEROX DISCLOSURE JOURNAL

ANTHRACENE-POLYMER BASED PHOTO- Proposed Classification
RESISTS U.S. Cl. 96/1,5
Jan Bares mt. Cl. G03g 5/04
Milan Stolka

The light-induced dimerization in anthracene containing poly-
mers is accompanied by changes in the solubility of the
materials. Since the photodimerization involves not only
neighboring anthracene groups in the same rnacromolecule but
also the groups from different macromolecules, the originally
soluble polymer or copolymer becomes crosslinked and insoluble
upon exposure to activating radiation. This effect can be

exploited to prepare photoresists which may be utilized in
common photoresist and printing processes. In operation the
photoresist is imagewise irradiated, developed with a solvent
and then treated as in other common printing and photoresist
processes.

Volume 2 Number 2 March/April 1977 11

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