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VAPOR PHASE DEPOSITION OF POLY-P-XYLYLENE DERIVATIVES BY A DEHYDROHALOGENATION PROCESS

IP.com Disclosure Number: IPCOM000023409D
Original Publication Date: 1977-Aug-31
Included in the Prior Art Database: 2004-Mar-30
Document File: 2 page(s) / 176K

Publishing Venue

Xerox Disclosure Journal

Abstract

This concept is generally directed to a technique for prep-aration of poly'-p-xylylene derivatives by a vapor phase dehydrohalogenation process. The process involves passing the vapor of ano-.-ha1ogenated para-xylene derivative, such as an w-chloro-p-xy1ene or -(o( -dich1oro-p-xy1er-e through a high temperature dehydrohalogenation chamber containing various strong bases. The resulting p-xylylene monomer is subse-quently deposited at a temperature below its ceiling tempera-ture and readily polymerized on a desirable substrate such as a carrier, glass bead, metal, plastic material, photoreceptor, etc., to form a polymeric thin film. The latter step can take place either in vacuum or at low pressure in the presence of an inert gas.

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XEROX DISCLOSURE JOURNAL

VAPOR PHASE DEPOSITION OF POLY- Proposed Classification
~-XYLYLENE DERIVKTIVES BY A tJ.S. Cl. 260/93.5A

DEHYDROHALOGENATION PROCESS mt. Cl. C08f 112/00
John W. Lin

This concept is generally directed to a technique for prep-
aration of poly'-p-xylylene derivatives by a vapor phase
dehydrohalogenation process. The process involves passing the
vapor of ano~.-ha1ogenated para-xylene derivative, such as an
w~-chloro-p-xy1ene or ~(o( -dich1oro-p-xy1er~e through a high

temperature dehydrohalogenation chamber containing various
strong bases. The resulting p-xylylene monomer is subse-
quently deposited at a temperature below its ceiling tempera-
ture and readily polymerized on a desirable substrate such as
a carrier, glass bead, metal, plastic material, photoreceptor,
etc., to form a polymeric thin film. The latter step can take
place either in vacuum or at low pressure in the presence of an
inert gas.

Volume 2 Number 4 July/August 1977 61

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