Browse Prior Art Database

SUBSTRATE TRANSPORT SUPPORT

IP.com Disclosure Number: IPCOM000023957D
Original Publication Date: 1979-Jun-30
Included in the Prior Art Database: 2004-Apr-01
Document File: 2 page(s) / 430K

Publishing Venue

Xerox Disclosure Journal

Abstract

In vacuum semiconductor growth systems, such as a molecular beam epitaxy, a rotating turret is adapted to hold a plurality of substrates upon which semiconductive layers may be deposited from thermal sources. These systems are held at ultra-high vacuum in order to minimize oxygen contamination. In order to transfer substrates into and out of the main vacuum chamber, it is desirable that

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XEROX DISCLOSURE JOURNAL

SUBSTRATE TRANSPORT SUPPORT Robert Z~Bachrach
Stig Hagstrom
Lars E~Swartz

If

F/Ge

Proposed Classification U~S~Cl. 118/500

mt. Cl, B05c 11/14

/0FIG. 2

[This page contains 1 picture or other non-text object]

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SUBSTRATE TRANSPORT SUPPORT (Cont~d)

In vacuum semiconductor growth systems, such as a molecular beam epitaxy, a

rotating turret is adapted to hold a plurality of substrates upon which semiconductive layers may be deposited from thermal sources. These systems are held at ultra-high vacuum in order to minimize oxygen contamination. In order to transfer substrates into and out of the main vacuum chamber, it is desirable that

such transfer be done without the necessity of venting the main chamber to atmospheric pressure

          0 This can be done with the interlock substrate transfer mechanism 1 which permits substrates to be readily so transferred while maintaining an accurately, reproducible temperature control for heating the

substrate.

The interlock substrate transfer mechanism 1 shown in Figure 1 consists of two

main parts, the receiver 2 secured on the rotatable turret 3 in the chamber of the system and the substrate holder 4 having a platform 5 upon which the substrate is

secured for processing. The substrate holder 4 may be made from molybdenum or other suitable, refractory metal.

The substrate holder 4 includes an annular base member 13 and a movable lock ring
10. As shown in Figure 2, lock ring 10 has bayonet-type slots 16. The outer rim of lock ring 10 extends to the outside of holder 4 providing exposure of slots 8. The holder 4, ring 10 and the member 13 are held in their operative relationship by means of fasteners provided at openi...