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PHOTOSENSITIVE POLYMERS

IP.com Disclosure Number: IPCOM000024107D
Original Publication Date: 1979-Oct-31
Included in the Prior Art Database: 2004-Apr-02
Document File: 2 page(s) / 128K

Publishing Venue

Xerox Disclosure Journal

Abstract

Novel photosensitive polymers are provided which are easily prepared and have unexpectedly high photosensitivity. The polymers are useful in making micro-images, relief-printing masters or planographic printing masters. Polymers (to include copolymers) prepared are poly-(vinylbenzyl chloride), poly ((vinylbenzyl chloride co(p-benzoylphenoxy-methyl)styrene)J , poly 1(p benzoylphenoxymethyl) styrene] and poly [vinylbenzyl chloride-co-(p-sulfonylazidobenzoyloxymethyl)sty-rene 3,

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XEROX DISCLOSURE JOURNAL

PHOTOSENSITIVE POLYMERS Proposed Classification 3oseph Y~C. Chu U.S. CL 101/453

Harry W. Gibson mt. CL B41n 1/00

Novel photosensitive polymers are provided which are easily prepared and have unexpectedly high photosensitivity. The polymers are useful in making micro~

images, relief-printing masters or planographic printing masters. Polymers (to include copolymers) prepared are poly-(vinylbenzyl chloride), poly ((vinylbenzyl chloride co(p-benzoylphenoxy-methyl)styrene)J , poly 1(p_benzoylphenoxymethyl) styrene] and poly [vinylbenzyl chloride-co-(p-sulfonylazidobenzoyloxymethyl)sty- rene 3,

Volume 4 Number 5 September/October 1979 573

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[This page contains 1 picture or other non-text object]