Browse Prior Art Database

LASER LITHOGRAPHY FOR LARGE AREA THIN FILM ELECTRONICS

IP.com Disclosure Number: IPCOM000024387D
Original Publication Date: 1980-Jun-30
Included in the Prior Art Database: 2004-Apr-02
Document File: 2 page(s) / 66K

Publishing Venue

Xerox Disclosure Journal

Abstract

Linear marking arrays and flat screen displays require high-densit y microelectronic circuits containing transistors, resistors, and capacitors over dimensions exceeding 10 inches. These circuits, in general, involve 5-10 Am minimum feature size. Presently, such circuits can be produced only by conventional photolithography using large photolithographic masks. These masks are very expensive to manufacture ($1,000 minimum), they are fragile, they have a short, useful life and even then a 99.9% defect-free image is very hard to achieve over the large area.

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XEROX DISCLOSURE JOURNAL

LASER LITHOGRAPHY FOR LARGE AREA THIN FILM ELECTRONICS Anonymous

Proposed Classification
U.S. C1. 430/20 Int. CI. C09k 3/34

Linear marking arrays and flat screen displays require high-densit y microelectronic circuits containing transistors, resistors, and capacitors over dimensions exceeding 10 inches. These circuits, in general, involve 5-10 Am minimum feature size. Presently, such circuits can be produced only by conventional photolithography using large photolithographic masks. These masks are very expensive to manufacture ($1,000 minimum), they are fragile, they have a short, useful life and even then a 99.9% defect-free image is very hard to achieve over the large area.

It is suggested here to use a focused, 5-10ym spot size, CW (continuous wave) laser which is steered and modulated by any convenient means available such as a computer to expose photoresist film on the substrate. Such a system is completely analogous to electron beam lithographic systems presently under development. The major difference is that while in an e-beam system < l~m resolution is desired, in thin film circuits 5-10)~m resolution is sufficient. It% significant to point out that e-beam lithography systems also use an auxiliary laser beam and laser inter- ferometry to achieve realignment in case of multiple exposures and to accomplish step and repeat operation. The proposed laser system would allow the cost- effective production of low-volume custom circuits....