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SILICON DIOXIDE OVERCOAT LAYER FOR TELLURIUM BASED OPTICAL DISK

IP.com Disclosure Number: IPCOM000025022D
Original Publication Date: 1983-Apr-30
Included in the Prior Art Database: 2004-Apr-04
Document File: 2 page(s) / 53K

Publishing Venue

Xerox Disclosure Journal

Abstract

Two problems exist with prior art optical disks: (a) oxidation of the media and (b) disk radial runout. Thin films of Si02 or A1203 deposited over tellurium (Te), the writing medium, will eliminate both problems.

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IEROX DISCLOSURE JOURNAL

Volume 8 Number 2 March/April 1983 165

Proposed Classification
U.S. C1. 365/126 Int. C1. Gllc 11/46

Two problems exist with prior art optical disks: (a) oxidation of the media and (b) disk radial runout. Thin films of Si02 or A1203 deposited over tellurium (Te), the writing medium, will eliminate both problems.

Individual glass samples and large disks were prepared with a 150A tellurium film followed by a 200A or a lOOOA Si02 overcoat. The following tests were completed with positive results:

(a) First surface ablation with a mastering station did not require unduly more threshold power levels.

(b) Optical and scanning electron microscopy inspection of the SiO overcoat above the Te hole pattern shows a uniform surface with no signs of degra3ation.

(c) Second surface evaluation on a media tester showed significantly lower levels of electronic noise, Since the random reflectivity of the Te surface was reduced substantially, the Te surface was heat treated during the Si02 electron beam evaporation in a way that either smooths over any discontinuities or reorients the grains. This reduction in electronic noise minimizes the adjustment period prior to the writing process.

SILICON DIOXIDE OVERCOAT LAYER FOR TELLURIUM BASED OPTICAL DISK Roberta M. Fay
Richard D. Weir

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  XEROX DISCLOSURE JOURNAL Volume 8 Number 2 March/April 1983

166

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