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MULTIPLE BELT FABRICATION OF ION BEAM DEPOSITED HYDROGENATED AMORPHOUS SILICON PHOTORECEPTORS

IP.com Disclosure Number: IPCOM000025275D
Original Publication Date: 1984-Jun-30
Included in the Prior Art Database: 2004-Apr-04
Document File: 2 page(s) / 107K

Publishing Venue

Xerox Disclosure Journal

Abstract

The ion beam deposition of hydrogenated amorphous silicon films for use in xerographic photoreceptor applications has recently been disclosed. The figure illustrates a scheme for scaling up the ion beam deposition of such films for the fabrication of multiple photoreceptor belts which could be used, for example, in high speed printers such as the Xerox 9700. In the figure, a plurality of belt substrates 10 each of which is movably positioned by two rollers 12 and 14 with the belt driven about the rollers by suitable means not shown. In the figure, the belt roller devices are illustrated as being arranged for closest packing to revolve around a central core again by suitable means not shown. As the belt roller assemblies revolve and as the belt rotates about the roller assemblies, they are exposed to a silicon/silicon hydrides atmosphere created by the plurality of ion beam flux sources (G1 - G4) used to direct an ion beam toward water cooled silicon targets (T1 - T4). To ensure uniforom deposition and maximum deposition rate near glancing angle of the order of 15 by an intense collimated low energy

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KEROX DISCLOSURE JOURNAL

MULTIPLE BELT FABRICATION OF ION BEAM DEPOSITED HYDROGENATED AMORPHOUS SILICON PHOTORECEPTORS Koji Okumura
Gerald P. Ceasar

Proposed Classification
U.S. C1. 204/192S Int. C1. C23c 15/00

The ion beam deposition of hydrogenated amorphous silicon films for use in xerographic photoreceptor applications has recently been disclosed. The figure illustrates a scheme for scaling up the ion beam deposition of such films for the fabrication of multiple photoreceptor belts which could be used, for example, in high speed printers such as the Xerox 9700. In the figure, a plurality of belt substrates 10 each of which is movably positioned by two rollers 12 and 14 with the belt driven about the rollers by suitable means not shown. In the figure, the belt roller devices are illustrated as being arranged for closest packing to revolve around a central core again by suitable means not shown. As the belt roller assemblies revolve and as the belt rotates about the roller assemblies, they are exposed to a silicon/silicon hydrides atmosphere created by the plurality of ion beam flux sources (G1 -- G4) used to direct an ion beam toward water cooled silicon targets (T1 -- T4). To ensure uniforom deposition and maximum deposition rate near glancing angle of the order of 15 by an intense collimated low energy

Volume 9 Number 3 Mav/June 1984 171

[This page contains 1 picture or other non-text object]

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MULTIPLE BELT FABRICATION OF ION BEAM DEPOSITED HYDROGENATED AMORPHOUS SILICON PHOTORECEPTORS (Cont'd)

ion beam of hydrogen and a rare gas, typically argon, is provided by either an...