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ENHANCED CONTAMINANT OUTGASSING IN AN ULTRA-HIGH VACUUM SYSTEM EMPLOYING A MICROWAVE GENERATOR

IP.com Disclosure Number: IPCOM000025458D
Original Publication Date: 1985-Aug-31
Included in the Prior Art Database: 2004-Apr-04
Document File: 2 page(s) / 87K

Publishing Venue

Xerox Disclosure Journal

Abstract

W e propose the use of a microwave generator tuned to vibrational or rotational frequencies of contaminant molecules as a method for aiding degassing or dissolution of these contaminants in ultra-high vacuum systems.

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XEROX DISCLOSURE JOURNAL

ENHANCED CONTAMINANT OUTGASSING Proposed Classification IN AN ULTRA-HIGH VACUUM SYSTEM U.S. CI. 250/492.1 EMPLOYING A MICROWAVE GENERATOR Int. C1. A61k 27/02 Henry Woo Sang, Jr.

Brent Krusor

We propose the use of a microwave generator tuned to vibrational or rotational frequencies of contaminant molecules as a method for aiding degassing or dissolution of these contaminants in ultra-high vacuum systems.

The use of microwave generators would be in lieu of or in support of the use of heaters or infrared lamps. used to bake out such vacuum systems.

The advantages of microwaves over present heating are several fold. First, it is an efficient use of energy by expending only energy on contaminants in the system and would not require as much energy or time as baking. Second, it would lessen chemisorption of contaminants by the system wal Is resulting in a cleaner vacuum. Third, microwaves would provide more even distribution of energy per unit volume cornpared to heat supplied from a heater. Fourth, the use of microwaves provides the ability to cleanse adsorbed contaminants in a valved-off system compartment while maintaining ultra-high vacuum at low temperatures in other systeln compartments: Fifth, microwaves provide the possibility of being selective in the excitation and efficient removal of specific contaminant species. Lastly, microwaves are less harmful to the vacuum chamber and system than heating.

In the molecular flow region of an ultra-high vacuum system, the contaminants are to be found on the walls of a vacuum chamber. It is a random process for these gases to migrate to a pump which acts as a collector for contaminants. In moving from this pressure region limit of about Torr or lower, there is removal of adsorbe...