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ION BEAM DEFLECTION ELECTRODES FOR IONOGRAPHIC IMAGE HEADS

IP.com Disclosure Number: IPCOM000025944D
Original Publication Date: 1989-Apr-30
Included in the Prior Art Database: 2004-Apr-04
Document File: 2 page(s) / 111K

Publishing Venue

Xerox Disclosure Journal

Abstract

In an ionographic device of the type described in U.S. 4,524,371 to Sheridon et al., image quality defects referred to as blooming and solid area trail edge raggedness are sometimes noted. These problems arise from the effect of the electric field of ions already deposited on the charge retentive surface on ions projected towards the surface in subsequent image production. The trajectory of projected ions is altered, so that the ions do not land in expected positions.

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XEROX DISCLOSURE JOURNAL

ION BEAM DEFLECTION ELECTRODES Proposed Classification FOR IONOGRAPHIC IMAGE HEADS
Eric J. Schneider

U.S. C1.346/159 Int. C1. Gold 15/06

FIG. 1

14

DEFLECTION
ELECTRODE
VOLTAGE

Vbiar

Time

FIG. 2

Volume 14 Number 2 March/April 1989 55

[This page contains 1 picture or other non-text object]

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ION BEAM DEFLECTION ELECTRODES FOR IONOGRAPHIC IMAGE HEADS (Cont'd)

In an ionographic device of the type described in U.S. 4,524,371 to Sheridon et al., image quality defects referred to as blooming and solid area trail edge raggedness are sometimes noted. These problems arise from the effect of the electric field of ions already deposited on the charge retentive surface on ions projected towards the surface in subsequent image production. The trajectory of projected ions is altered, so that the ions do not land in expected positions.

With reference to Figure 1, it is proposed that in an ionographic device having a coronode 10 generating ions, and a fluid source 12 creating fluid flow past coronode 10 and carrying ions over an array of pixel control electrodes 13, which control whether ions carried therepast are deposited on imaging surface 14 moving in process direction 16, an additional deflection electrode 20 for controlling the trajectory of the ions directed to the imaging surface be provided. This electrode may be located either after or before the ion gap 22 with respect to process direction 16. Deflection electrode 20 is normally biase...