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PHOTOPOLYMER CLEANING BLADE, TRANSPORT AND FUSING ROLLS

IP.com Disclosure Number: IPCOM000026782D
Original Publication Date: 1993-Aug-31
Included in the Prior Art Database: 2004-Apr-06
Document File: 2 page(s) / 72K

Publishing Venue

Xerox Disclosure Journal

Abstract

Disclosed are blade cleaner, transport and fusing roll articles for use in electrophotographic devices and a method for making same. The articles are comprised of polymeric material derived from a photosensitive precursor, for example, CYRELB photopolymer available from E.I. DuPont. The process for preparing the articles comprise the steps of: depositing the photosensitive precursor onto an adhesive bearing polyester backing support material; overcoating the photosensitive precursor with a negative photoresist protective layer; exposing the negative photoresist to a selectively masked or patterned ultra violet radiation source to selectively polymerize the photopolper precursor; washing or etching away, with optional mechanical assistance, the nonpolymerized photopolymer precursor with an organic solvent mixture such as isopropanol and perchloroethylene to afford relief patterns having dimensions of the desired articles; drying the relief patterns; and exposing a second time to ultra violet radiation to further dry and cureharden the article relief patterns.

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XEROX DISCLOSURE JOURNAL

PHOTOPOLYMER CLEANING Proposed Classification BLADE, TRANSPORT AND FUSING
ROLLS Int. C1. G03g 21/00 Herbert C. Relyea

U.S. C1.355/299

Disclosed are blade cleaner, transport and fusing roll articles for use in electrophotographic devices and a method for making same. The articles are comprised of polymeric material derived from a photosensitive precursor, for example, CYRELB photopolymer available from E.I. DuPont. The process for preparing the articles comprise the steps of: depositing the photosensitive precursor onto an adhesive bearing polyester backing support material; overcoating the photosensitive precursor with a negative photoresist protective layer; exposing the negative photoresist to a selectively masked or patterned ultra violet radiation source to selectively polymerize the photopolper precursor; washing or etching away, with optional mechanical assistance, the nonpolymerized photopolymer precursor with an organic solvent mixture such as isopropanol and perchloroethylene to afford relief patterns having dimensions of the desired articles; drying the relief patterns; and exposing a second time to ultra violet radiation to further dry and cureharden the article relief patterns.

Advantages of the process over current processes for related article manufacture are time and cost savings, improved quality and consistency; elimination of machinery or cutting steps; and the resulting relief pattern is flexible and conformable to cyli...