Browse Prior Art Database

ANNULAR CO2 SNOW CLEANING NOZZLE

IP.com Disclosure Number: IPCOM000027234D
Original Publication Date: 1995-Dec-31
Included in the Prior Art Database: 2004-Apr-07
Document File: 4 page(s) / 233K

Publishing Venue

Xerox Disclosure Journal

Abstract

Disclosed is a process and apparatus for cleaning cylindrical substrates such as photoreceptor drums and the like. The process comprises: coaxially aligning a slotted annular nozzle around the outer periphery of one end of a cylindrical substrate to be cleaned; creating relative movement between the nozzle and the cylindrical substrate in a direction parallel to the axis of both the nozzle and the drum; and directing a stream of carbon dioxide snow particles from the nozzle against a continuous ring shaped zone around the outer surface of the cylindrical substrate to incrementally and progressively clean the outer surface from the one end of the substrate to the other end.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 44% of the total text.

Page 1 of 4

XEROX DISCLOSURE JOURNAL

ANNULAR C02 SNOW CLEANING NOZZLE U.S. C1.134/007 Eugene A. Swain

Proposed Classification Int. C1. B08b 07/00

I XEROX DISCLOSURE JOURNAL - Vol. 20 No. 6 NovernbedDecember 1995 481

I I

I

I I I I I I I I I I I I I I I I I I I I I 1

I I I I I I I I I I I I I I I

[This page contains 1 picture or other non-text object]

Page 2 of 4

ANNULAR C02 SNOW CLEANING NOZZLE(Cont'd)

45 46 36

FIG. 2

482 XEROX DISCLOSURE JOURNAL - Vol. 20 No. 6 NovernbedDecember 1995

1

I I I I I I I I I I I I I I I I I

I I I I I I I I I I I I I I I I I I I I I I I I I

I I I I I I I I I I I I I I I I I I I I I I I I I I

[This page contains 1 picture or other non-text object]

Page 3 of 4

I ANNULAR CO2 SNOW CLEANING NOZZLE(Cont'd)

I

 I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I
I
I
I

Disclosed is a process and apparatus for cleaning cylindrical substrates such as photoreceptor drums and the like.

The process comprises: coaxially aligning a slotted annular nozzle around the outer periphery of one end of a cylindrical substrate to be cleaned; creating relative movement between the nozzle and the cylindrical substrate in a direction parallel to the axis of both the nozzle and the drum; and directing a stream of carbon dioxide snow particles from the nozzle against a continuous ring shaped zone around the outer surface of the cylindrical substrate to incrementally and progressively clean the outer surface from the one end of the substrate to the other end.

The apparatus comprises: means to direct a stream of carbon dioxide snow particles through an annular slot against the outer periphery of a cylindrical substrate; means to create relative movement between the nozzle and the cylindrical substrate in a direction parallel to the axis of both the nozzle and the drum; and means to direct the stream of carbon dioxide snow particles from the nozzle against continuous ring shaped zone around the outer surface of the cylindrical substrate to incrementally and progressively clean the outer surface from one end of the substrate to the other end.

Illustrated in Figure 1 is a cylindrical sleeve cleaning apparatus 10 comprising a cylindrical housing 12. Cylindrical housing 12 comprises cylindrical sections 14,16,18, and 19. Flanges 20 and 22 are fastened together by suitable means such as bolting rigidly joining cylindrical sections 14 and 16. An end plate 24
having an exhaust port 26 is fastened to and supported by flange 28 of cylindrical section 14. Cylindrical section 16 is rigidly joined to cylindrical section 18 by means of bolted flanges 23 and 25.

Referring to both Figures 1 and 2, flange 27 on the end of cylindrical section 18
opposite flange 23 is bolted to ring manifold 30 which is aligned coaxially with cylindrical section 18. Ring manifold 30 contains two annular distribution and pressure equalizing chambers 32 and 34. Chamber 32 is connected through a feed line 35 to fluid supply line 36. Control valve 38 mo...