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Single edge rounding

IP.com Disclosure Number: IPCOM000029872D
Original Publication Date: 2004-Jul-15
Included in the Prior Art Database: 2004-Jul-15
Document File: 2 page(s) / 12K

Publishing Venue

IBM

Abstract

Ion milling is used to round the edges of a slider in an additional special etching step where a continuously titled ion beam is directed over the edge of a photoresist

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Single edge rounding

The principle is shown in figure 1. The photo resist is used to shadow a part of the slider substrate. This shadow will be changed due to different tilting angles of the Ion Mill pallet. Setting angle and etching time controls the shape of the edge .

Figure 1: principle

    To prevent redeposition on the rising edge of the photo resist the process starts with a small angle (step 1-large shadow) and ends with a steep angle (step 8-small shadow). To avoid overheating of the slider by the ion beam at great tilting angles (e.g. step 5-8) cooling steps are provided by closing the shutter for a few minutes.

    The feasibility of the method was demonstrated with a simplified photo mask and a Tencor scan shown in figure 2. Figure 3 shows the result of the Tencor scan. No redeposition material has been detected.

ion beam

photo resist


1..............8 steps

etching areaslider substrate

Tencor scan

Figure 2: schematics of a used photo mask

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Tencor Scan

°4000A

°2000A

0A

°

°-2000A

-4000A°

°-6000A

°-8000A

-1.0µm

-1.2µm

-1.4µm

-1.6µm

0.8° slope

Normal

0 16 32 47 63 79 95 111 126 142 158

Scan Length (µm)

Figure 3: result of Tencor Scan

2

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