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Passive De-Gas Unit for Photo Resist

IP.com Disclosure Number: IPCOM000032207D
Publication Date: 2004-Oct-26
Document File: 3 page(s) / 344K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a passive de-gas unit for photo resist, which removes dissolved or micro-entrained/suspended gasses using a contained, pump actuated pressure drop chamber. Benefits include a solution that requires very low maintenance and is relatively inexpensive to manufacture.

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Passive De-Gas Unit for Photo Resist

Disclosed is a method for a passive de-gas unit for photo resist, which removes dissolved or micro-entrained/suspended gasses using a contained, pump actuated pressure drop chamber. Benefits include a solution that requires very low maintenance and is relatively inexpensive to manufacture.

Background

Photo resists manufactured at sea level will out gas at altitude. This accumulation of gas causes an incomplete dispense and a high coat standard deviation, resulting in tool downtime and the potential for product issues. Additionally, the thicker the resist, the more likely it is to have out gassing induced performance issues. The elimination of this gas is essential to enable fabrication at higher altitudes.

Currently, resist tracks using a single stage resist pump are unprotected from gas-in-line disturbances. Changing to a two-stage pump would alleviate some of these issues, but the cost is prohibitive.

General Description

In the disclosed method, resist enters through the resist inlet and is pulled through the interchangeable orifice or check valve, generating the pressure drop. The pressure drop across the sized orifice causes any dissolved gasses to outgas. The gas rises up the tube and is collected at the top of the pressure drop reservoir. Gas is vented from the top of the reservoir using the vent opening. Photo resist is pulled to the resist pump from the bottom of the reservoir through an adjustable opening. An interchangeable orif...