Browse Prior Art Database

Cathode Sputtering System With Sealing Flap

IP.com Disclosure Number: IPCOM000034668D
Original Publication Date: 1989-Apr-01
Included in the Prior Art Database: 2005-Jan-27
Document File: 2 page(s) / 70K

Publishing Venue

IBM

Related People

Theilmann, B: AUTHOR

Abstract

For depositing thin uniform, conductive or insulating layers on a substrate in a cathode sputtering system, the process chamber and the electrodes should be axially symmetrical to ensure a uniform plasma intensity. If a pivotable shutter is provided for temporarily covering the substrate, for example, during the cleaning of the target, the high- frequency axial symmetry is disturbed by the slot in the housing wall of the process chamber as long as the shutter is in its inoperative position outside the housing. This leads to non-uniformly sputtered layers. To avoid this, a sealing flap is provided inside the process chamber. In the inoperative position of the shutter, this flap rests against the inner housing wall of the process chamber, covering the slot.

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Cathode Sputtering System With Sealing Flap

For depositing thin uniform, conductive or insulating layers on a substrate in a cathode sputtering system, the process chamber and the electrodes should be axially symmetrical to ensure a uniform plasma intensity. If a pivotable shutter is provided for temporarily covering the substrate, for example, during the cleaning of the target, the high- frequency axial symmetry is disturbed by the slot in the housing wall of the process chamber as long as the shutter is in its inoperative position outside the housing. This leads to non-uniformly sputtered layers. To avoid this, a sealing flap is provided inside the process chamber. In the inoperative position of the shutter, this flap rests against the inner housing wall of the process chamber, covering the slot. Process chamber 1 comprises a lower electrode 2, supporting individual substrates 3, and an upper electrode (not shown). For temporarily covering electrode 2 and substrates 3 on it, shutter 4 is pivoted into chamber 1 through slot 5. The vacuum pump opening in the chamber housing is provided with a screen 6 to keep chamber 1 axially symmetrical. The figures show shutter 4 in its inoperative position in a pocket (not shown) of chamber 1. The operative position of shutter 4 is marked by broken lines in Fig. 1. Slot 5 is sealed by sealing flap 7 which is shown in the opened, and thus, the unbent, state in Fig. 1. Sealing flap 7 consists of an elastic strip, preferably of...