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New Polymer for Deep UV Resist Formulation

IP.com Disclosure Number: IPCOM000035111D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Babich, ED: AUTHOR [+4]

Abstract

Negative resists based upon photo-acid initiated cationic polymerization of epoxy resins [1, 2] were reported in [1, 2] followind the advent of onium salts [3,4,5]. An efficient acid-generating onium salt, triphenylsulfonium hexafluoroantimonate [6], absorbs light in the deep UV, producing acid upon direct photolysis in this region of the spectrum. Problems with negative resists based upon crosslinking are swelling which may occur during development with organic solvents and large optical densities of resins over the exposure wavelengths. Both of these difficulties lead to poor image quality, distortion and adhesion loss for the former and undercut image profiles for the latter.

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New Polymer for Deep UV Resist Formulation

Negative resists based upon photo-acid initiated cationic polymerization of epoxy resins [1, 2] were reported in [1, 2] followind the advent of onium salts [3,4,5]. An efficient acid-generating onium salt, triphenylsulfonium hexafluoroantimonate [6], absorbs light in the deep UV, producing acid upon direct photolysis in this region of the spectrum. Problems with negative resists based upon crosslinking are swelling which may occur during development with organic solvents and large optical densities of resins over the exposure wavelengths. Both of these difficulties lead to poor image quality, distortion and adhesion loss for the former and undercut image profiles for the latter.

The difficulties mentioned above have been addressed by converting low molecular weight, optically transparent styrene-allyl alcohol copolymers, Monsanto RJ100 and RJ101, to epoxide resins which may be cationically polymerized upon exposure to deep UV light via the acid generated by triphenylsulfonium hexafluoroantimonate. Styrene-allyl alcohol copolymer is converted easily to the glycidyl ether by the addition of an epichorohydrin solution of the copolymer to sodium hydride followed by heating. A dilute reactant copolymer solution is preferred to avoid large increases in the molecular weight of the product relative to the reactant. A resist is formulated from 30 wt% of the styrene-allyl glycidyl ether copolymer and 2 wt% of solids onium salt in...