Browse Prior Art Database

Lapping Measurement

IP.com Disclosure Number: IPCOM000035695D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 2 page(s) / 47K

Publishing Venue

IBM

Related People

Lagro, HC: AUTHOR [+2]

Abstract

Lapping measurement is taken directly from selected head elements as opposed to lapping guides.

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Lapping Measurement

Lapping measurement is taken directly from selected head elements as opposed to lapping guides.

An unlapped multitrack head 10 is shown partially in the figure. Previously, lapping guides were provided at either end of the head to measure the amount of lapping in direction 11. Here, selected head elements 12 and 13 have been provided with increased resistance material 14 at the top of the head, and with enlarged contact pads 15 to comprise test probe areas. Each of the selected heads is monitored from the test probe areas to measure the resistance thereof to detect when the lapping has reached the proper distance through areas 14. By monitoring the selected head elements, it is possible to monitor the lapping process across the entire head to prevent contour lapping, e.g., crown or smile.

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