Browse Prior Art Database

Novel Nanostructures Utilizing Patterned Surfaces

IP.com Disclosure Number: IPCOM000035764D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 2 page(s) / 50K

Publishing Venue

IBM

Related People

Broers, AN: AUTHOR [+3]

Abstract

Contamination resist ridges may be used to form fine lines and fine gaps in soft, ordinarily discontinuous, metals.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 72% of the total text.

Page 1 of 2

Novel Nanostructures Utilizing Patterned Surfaces

Contamination resist ridges may be used to form fine lines and fine gaps in soft, ordinarily discontinuous, metals.

The fabrication of nanostructures (fine lines, gaps interconnections, tunnel junctions, Josephson weak links, etc.) from soft metals, such as Pb, Sn, In, etc., has not been possible with standard techniques, particularly for structure thickness less than 1000Ao . When such metals and their alloys are deposited at room temperature on the smooth surfaces that are generally used (SiO2, glass, Si3N4, Al2O3, etc.), a discontinuous film results.

The technique disclosed here is to use a finely patterned surface as the substrate on which the soft metal is deposited. The surface is patterned by E- beam or X-ray lithographic techniques. For example, contamination resist may be used to form two closely adjacent parallel ridges 10, 11 on a substrate 12, as shown in Fig. 1, thereby forming a trough or channel 13. The presence of such a channel has been found to influence the growth of the thin metal film so as to produce a continuous metal strip within the channel. Region 14 could thus be continuous while regions 16 are discontinuous. Region 14 thus behaves as an isolated conductive line in a layer which is elsewhere discontinuous and therefore non-conductive. Etching is thus not needed to form a fine conductive line. The line is complete after metal deposition. This technique should be useful for line widths les...