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Browse Prior Art Database

Mechanism for Batch Wafer Notch Alignment

IP.com Disclosure Number: IPCOM000035864D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 2 page(s) / 63K

Publishing Venue

IBM

Related People

Maring, SJ: AUTHOR [+2]

Abstract

A device which uses a notching cam for alignment of semiconductor wafers has been developed which provides improved accuracy over procedures which use the flat of the wafer for alignment.

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Mechanism for Batch Wafer Notch Alignment

A device which uses a notching cam for alignment of semiconductor wafers has been developed which provides improved accuracy over procedures which use the flat of the wafer for alignment.

In the manufacture of semiconductor wafers, alignment of the wafers in their carrier is significant in processing operations. Fig. 1 shows a mechanism which uses a notching cam 1 which engages a notch in the wafer 5 as it is rotated by drive rollers 2 while in the cassette carrier 6. The notching cam rotates on a pivot shaft 3 with a fixed shaft 4 as part of the mechanism which stops the rotation of the cam when the notch is engaged by the cam 1 thereby stopping the rotation of the wafer.

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In Fig. 2A, on one end of the cam is the notching surface 7 which is machined to closely approximate the notch 9 on the wafer. The counterweight 8 on the other end of the cam 1 provides the mass which determines the contact force of the tip against the wafer and the response time for the cam to engage the notch as shown in Fig. 2B.

The new method has much greater accuracy than the previous one shown in Fig. 3A which used a single roller 10 to drive the wafer with the flat. In that method when the flat reached the roller, the wafer would stop rotating and drop down onto side plates 12 (Fig. 3B).

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