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Etch Bath for Films

IP.com Disclosure Number: IPCOM000035906D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Denison, EV: AUTHOR [+2]

Abstract

An etchant bath for a magnetic film containing nickel, iron and alumina and a nickel-iron titanium laminate comprises an aqueous solution of ammonium persulfate, nitric acid, ammonium oxalate and a fourth component which is dependent on the composition of the film to be etched.

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Etch Bath for Films

An etchant bath for a magnetic film containing nickel, iron and alumina and a nickel-iron titanium laminate comprises an aqueous solution of ammonium persulfate, nitric acid, ammonium oxalate and a fourth component which is dependent on the composition of the film to be etched.

The film containing nickel, iron and alumina is etched by the aqueous solution mentioned above with the fourth component being phosphoric acid. For laminate films of nickel-iron with titanium, hydrofluoric acid is the fourth component.

Pattern definition of the films is improved with these etchants.

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