Browse Prior Art Database

Method of Modifying the Wall Profile of Resist Patterns

IP.com Disclosure Number: IPCOM000036014D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 2 page(s) / 45K

Publishing Venue

IBM

Related People

Kreuter, V: AUTHOR

Abstract

By the controlled reimplementation of solvent into an exposed resist layer prior to its development, the wall profile and the dimensions of openings in the developed resist pattern are controlled.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Method of Modifying the Wall Profile of Resist Patterns

By the controlled reimplementation of solvent into an exposed resist layer prior to its development, the wall profile and the dimensions of openings in the developed resist pattern are controlled.

Having been applied, prebaked, exposed and postbaked, the resist layer is exposed to the vapor of the solvent (such as butylacetate) to be implemented. The implemented amount of solvent depends on the time the resist is exposed to the solvent and the vapor pressure. The nature of the solvent is not critical. The implementation increases the solubility of the resist and decreases the angle of inclination the walls of the openings in the resist form with the horizontal.

1

Page 2 of 2

2

[This page contains 6 pictures or other non-text objects]