Browse Prior Art Database

Focused Airflow Class 1 Working Volume for Semiconductor Processing

IP.com Disclosure Number: IPCOM000036117D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-28
Document File: 2 page(s) / 44K

Publishing Venue

IBM

Related People

Mueller, RP: AUTHOR [+2]

Abstract

This article describes a novel approach to the creation and maintenance of a clean room environment which minimizes the cost associated with air handling, eliminates the design and construction of vertical laminar flow clean rooms, and allows operations to be conducted in a protected environment where just cap and gown may be adequate to assist in the wafer processing.

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Focused Airflow Class 1 Working Volume for Semiconductor Processing

This article describes a novel approach to the creation and maintenance of a clean room environment which minimizes the cost associated with air handling, eliminates the design and construction of vertical laminar flow clean rooms, and allows operations to be conducted in a protected environment where just cap and gown may be adequate to assist in the wafer processing.

The preternal approach is to conduct all wafer processing operations in a specially structured air flow having a down-outward characteristic. All processing tools are placed within this air flow, and circulation through and out is achieved through a perforated top of the tooling coupled to a perforated floor. Under the floor a small air space allows air extraction and outside venting. The air flow is focused outside the wafer area in a down placed position with respect to the tool surface.

Referring to the figures which depict the cross section of the elemental unit which generates the focused clean air flow, a plenum 10 with rectangular cross section having overall sizes about 36" x 36", is cut along a diagonal.

An elliptically shaped filter 12 is mounted across the plenum aperture to define an elliptically shaped, downward-directed 1/2 elliptical dome. Behind the filter 12 is an air partitioning unit formed by a set of sheet metal stream dividers 14 placed so to project the air flow in the direction of the foci 16 of the 1/2 elli...