Browse Prior Art Database

Local Pressure Intensifier for Exposure Enhancement During Film Growth

IP.com Disclosure Number: IPCOM000036639D
Original Publication Date: 1989-Oct-01
Included in the Prior Art Database: 2005-Jan-29
Document File: 2 page(s) / 73K

Publishing Venue

IBM

Related People

Rettner, CT: AUTHOR

Abstract

This invention applies to the production of films using evaporators or molecular beam epitaxy techniques. It allows a growing film to be exposed to pressures which would damage the deposition elements (ovens, filaments, etc.). This permits higher levels of oxidation than could otherwise be achieved, extending the range of possible structures that can be grown. (Image Omitted)

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Local Pressure Intensifier for Exposure Enhancement During Film Growth

This invention applies to the production of films using evaporators or molecular beam epitaxy techniques. It allows a growing film to be exposed to pressures which would damage the deposition elements (ovens, filaments, etc.). This permits higher levels of oxidation than could otherwise be achieved, extending the range of possible structures that can be grown.

(Image Omitted)

The production of certain structures using evaporators or molecular beam epitaxy (MBE) techniques often requires the presence of a background gas during deposition. The approach is sometimes referred to as reactive MBE. The background gas serves to modify the growing film chemically in some desired manner. For example, in the growing of the new high Tc superconductor films of YBa2Cu30X, the oxygen cannot be readily provided in the beams (since oxide sources produce only metal beams). Instead, it is necessary to add ambient oxygen gas. However, the necessary pressures of such gases can rapidly degrade the apparatus, which has many high temperature components, such as filaments that also oxidize and eventually expire.

Disclosed is a means to obtain a high local pressure in the region of the growing film while maintaining a relatively low ambient pressure. The basic idea is to place the substrate in a small tube which can be isolated periodically from the chamber and raised to some desired pressure, then re-exposed for depos...