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Browse Prior Art Database

Free Turning Eccentric Etch Insert

IP.com Disclosure Number: IPCOM000036864D
Original Publication Date: 1989-Nov-01
Included in the Prior Art Database: 2005-Jan-29
Document File: 2 page(s) / 58K

Publishing Venue

IBM

Related People

Eisenhuth, G: AUTHOR [+3]

Abstract

The planetary etch tooling redesign discussed herein results in improved chemical etch processing and yield together with reduced maintenance down-time on the tool.

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Free Turning Eccentric Etch Insert

The planetary etch tooling redesign discussed herein results in improved chemical etch processing and yield together with reduced maintenance down- time on the tool.

An existing etch process employs the planetary gear driven eccen tric etch wheel 1 shown in Fig. 1 for the purpose of providing a uniform chemical etch spray over the work piece 2 during etch processing. The geared etch insert holder(s) 3 have been determined, however, to limit the quality of the etch obtainable due to non-randomness of the spray pattern acting on the work piece. This lack of uniformity is related to debris build-up in the gear and results in jamming and increased tool maintenance.

The disclosed redesign of the etch tool, as shown in Fig. 2, uses the eccentric motion of free circular etch inserts to generate random motion, which is due alone to their slippage. Additionally, the elimination of the gearing removes a trap for debris build-up. The work piece 2 sits in an eccentric etch insert holder 1, which is free to rotate within the closed circle 3. As the etch wheel 4 rotates, the free turning etch eccentric also rotates freely, as applied in the Fig. 3 illustration.

The free turning eccentric etch concept provides much better etch uniformity along with much less machine down-time for maintenance than formerly experienced with the geared eccentric etch wheel.

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