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Orienting Field for Magnetic Film Deposition

IP.com Disclosure Number: IPCOM000037572D
Original Publication Date: 1989-Mar-01
Included in the Prior Art Database: 2005-Jan-29
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Ewasko, R: AUTHOR [+3]

Abstract

Apparatus is described for producing an orienting field for magnetic film deposition, such as by sputtering, for example.

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This is the abbreviated version, containing approximately 95% of the total text.

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Orienting Field for Magnetic Film Deposition

Apparatus is described for producing an orienting field for magnetic film deposition, such as by sputtering, for example.

Externally applied magnetic fields are required during deposition of magnetic layers to orient the magnetic film in a particular direction. One way in which this orienting field can be produced is by the use of the shutter of a deposition tool. The shutter 1 is made of a non-magnetic material and high curie temperature permanent magnets 2 and 3 are mounted on opposite sides of the shutter opening 4 to provide the necessary orientation field.

By mounting the magnets 2 and 3 on the inner and outer edges of opening 4, as shown in Fig. 1, a tangential orientation field is produced. By mounting the magnets 2 and 3 on the front and rear edges of the opening 4, as shown in Fig. 2, a radial field results.

In a specific deposition system, the wafers 5, upon which the magnetic film is to be deposited, are loaded into recesses of a pallet 6 which rotates around an axis 7 during deposition. By positioning a bar magnet 8 in the center of the deposition chamber right above the pallet plane, as shown in Fig. 3, a radial field can be generated. Bar magnet 8 can be either a permanent magnet or a current conducting solenoid.

To produce a circumferential field, a current conducting wire aligned on the axis 7 of the pallet 6 can be used. A current in the straight wire produces a magnetic field which is circular around...