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Electrostatic Pad or Brush Cleaner

IP.com Disclosure Number: IPCOM000037855D
Original Publication Date: 1989-Jul-01
Included in the Prior Art Database: 2005-Jan-30
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Cooper, DW: AUTHOR [+2]

Abstract

Disclosed is a method for removing strongly adhering material from surfaces without using liquids. The method uses a pad or brush to dislodge the material with the pad or brush being electrically charged to create an electrostatic field for retaining the dislodged material in the pad or brush.

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Electrostatic Pad or Brush Cleaner

Disclosed is a method for removing strongly adhering material from surfaces without using liquids. The method uses a pad or brush to dislodge the material with the pad or brush being electrically charged to create an electrostatic field for retaining the dislodged material in the pad or brush.

Strongly adherent particulate matter, such as that deposited wet and then dried on, is particularly difficult to remove and may cause contamination problems. Such material can cause reduced heat transfer, for example, where small tolerances are involved. Conventional cleaning methods involve rubbing the surface with a pad or brush, removing the dislodged material with liquid or with jets of gas. Liquids can leave contaminants behind and gases can disperse the particles to other areas where they can cause problems. The electrostatic pad or brush cleaner has the pad or brush mounted on a conductor that is connected to a source of DC voltage. The area to be cleaned is grounded or placed on a grounded conductor. As the pad or brush rubs the surface to be cleaned, material is dislodged and is retained in the pad or brush by the electrostatic field.

Experiments have shown that the electrified pad kept particles from being spread around the area being cleaned, in comparison to the spreading observed without electrification. The electrified pad successfully removed almost all test particles 2 microns in diameter that had been applied wet and allow...