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Laser Patterning of Superconducting Oxide Films

IP.com Disclosure Number: IPCOM000038151D
Original Publication Date: 1989-Nov-01
Included in the Prior Art Database: 2005-Jan-31
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hodgson, RT: AUTHOR

Abstract

Disclosed is a method of making patterns in superconducting oxide films. A single pulse of laser light at 308 nm turns the oxide film from a superconductor to an insulator, so that a pattern can be projected onto the film to make, for example, a SQUID magnetic field monitor. The amount of fluence required (200 mj/cm2) is quite small compared to the fluence used to ablate polymers, and such fluences can easily be handled by metal masks or by dielectric masks.

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Laser Patterning of Superconducting Oxide Films

Disclosed is a method of making patterns in superconducting oxide films. A single pulse of laser light at 308 nm turns the oxide film from a superconductor to an insulator, so that a pattern can be projected onto the film to make, for example, a SQUID magnetic field monitor. The amount of fluence required (200 mj/cm2) is quite small compared to the fluence used to ablate polymers, and such fluences can easily be handled by metal masks or by dielectric masks.

Preliminary results indicate that resolution of at least 1 micron can be achieved with masks formed by 25 micron tungsten wire.

Disclosed anonymously.

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