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Soft Film Bias Magnetoresistive Read Head Using Nickel-Iron Tantalum

IP.com Disclosure Number: IPCOM000038360D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Jan-31
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Aboaf, J: AUTHOR [+4]

Abstract

A soft film bias magnetoresistive (MR) head generally includes a trilayer thin film structure. The structure is composed of a soft magnetic film, a high resistivity spacer, and the MR sensor film. The soft magnetic film can be made from a nickel-iron tantalum material, sputter deposited on a substrate. As shown in the figure, an MR head includes an MR sensor film 10, a high resistivity spacer 12, and a soft magnetic film 14 as a read transducer. The read transducer is separated from two ferrite blocks 16 and 18 by an insulation layer 20 of alumina, for instance. The ferrite blocks are generally constructed and actuated to perform a write operation. The magnetic film 14 is generally made of a nickel-iron material, normally in the 81-19% range. The high resistivity spacer 12 is betatantalum as a magnetic insulation layer.

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Soft Film Bias Magnetoresistive Read Head Using Nickel-Iron Tantalum

A soft film bias magnetoresistive (MR) head generally includes a trilayer thin film structure. The structure is composed of a soft magnetic film, a high resistivity spacer, and the MR sensor film. The soft magnetic film can be made from a nickel-iron tantalum material, sputter deposited on a substrate. As shown in the figure, an MR head includes an MR sensor film 10, a high resistivity spacer 12, and a soft magnetic film 14 as a read transducer. The read transducer is separated from two ferrite blocks 16 and 18 by an insulation layer 20 of alumina, for instance. The ferrite blocks are generally constructed and actuated to perform a write operation. The magnetic film 14 is generally made of a nickel-iron material, normally in the 81-19% range. The high resistivity spacer 12 is betatantalum as a magnetic insulation layer. The soft film bias layer 14 is nickel- iron tantalum containing in the range of 3 atomic percent of tantalum. The layers can be deposited through any vapor deposition method. Sputtering is preferred since two targets can be used to deposit all of the layers. One target can be nickel-iron in the required range for the MR layer 10, while the second is tantalum. Co-sputtering from both targets produces the soft film bias layer 14. The tantalum target alone produces the magnetic insulation layer 12. Control of the deposition process parameters will produce the required alloy for the...