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Ultrasonic Free-Standing Jet for Plating and Etching

IP.com Disclosure Number: IPCOM000039072D
Original Publication Date: 1987-Apr-01
Included in the Prior Art Database: 2005-Feb-01
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

von Gutfeld, RJ: AUTHOR [+2]

Abstract

High frequency ultrasound (MHz range) is used to produce local agitation at a cathode or anode (working electrode) interface in a chemical or electrochemical cell. The ultrasound is directed into a free-standing jet of electrolyte to produce enhanced maskless patterning. Generally, frequencies in excess of about l0 MHz are used in systems where the nozzle for the electrolyte jet is less than about 3 mm in diameter. In this system, an electrolyte storage container l0 is connected to a plating cell l2 via a tube l4 and circulation pump l6. An ultrasound power supply l8 is connected to the transducer 20 which emits an ultrasound beam 22 into the jet 24 of electrolyte which exits through nozzle 26. An anode 28 and cathode 30 complete the plating cell.

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Ultrasonic Free-Standing Jet for Plating and Etching

High frequency ultrasound (MHz range) is used to produce local agitation at a cathode or anode (working electrode) interface in a chemical or electrochemical cell. The ultrasound is directed into a free-standing jet of electrolyte to produce enhanced maskless patterning. Generally, frequencies in excess of about l0 MHz are used in systems where the nozzle for the electrolyte jet is less than about 3 mm in diameter. In this system, an electrolyte storage container l0 is connected to a plating cell l2 via a tube l4 and circulation pump l6. An ultrasound power supply l8 is connected to the transducer 20 which emits an ultrasound beam 22 into the jet 24 of electrolyte which exits through nozzle 26. An anode 28 and cathode 30 complete the plating cell. Cathode 30 is connected to a electrolyte 32 returns to the storage container l0 through tube 34. Enhancement in plating (etching) occurs because the ultrasound breaks up the diffusion layer in the region of the cathode (anode) interface. In addition, for high intensity sound, there can be local heating of the interface which also promotes plating (etching). Both electrochemical and electrodeless plating and etching can be done using this scheme. The sound can be delivered from a focused transducer to maximize the ultrasonic energy in the jet stream. The agitation will also give rise to enhanced nucleation which brings about a more uniform and smoother deposit than can...