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Silicon-Charged RIE Electrode

IP.com Disclosure Number: IPCOM000039129D
Original Publication Date: 1987-Apr-01
Included in the Prior Art Database: 2005-Feb-01
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

McGouey, RP: AUTHOR

Abstract

This publication describes a relatively inexpensive electrode used for the uniform reactive ion etching (RIE) of polymers using silicon-bearing etch barriers. Active fluoride ion is frequently used, alone or in combination with oxygen, when reactive ion etching silicon, silicon compounds, or polymers protected by siliceous masks. In order to provide the chemical equilibrium and, therefore, etch uniformity spatially across a large area electrode, RIE processors have constructed their driven electrodes from polycrystalline silicon. These electrodes are costly. A suitable replacement providing the same reaction uniformity in the plasma and costing far less has been tested. The body of the electrode is fabricated from materials, such as aluminum or pyrolytic graphite.

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Silicon-Charged RIE Electrode

This publication describes a relatively inexpensive electrode used for the uniform reactive ion etching (RIE) of polymers using silicon-bearing etch barriers. Active fluoride ion is frequently used, alone or in combination with oxygen, when reactive ion etching silicon, silicon compounds, or polymers protected by siliceous masks. In order to provide the chemical equilibrium and, therefore, etch uniformity spatially across a large area electrode, RIE processors have constructed their driven electrodes from polycrystalline silicon. These electrodes are costly. A suitable replacement providing the same reaction uniformity in the plasma and costing far less has been tested. The body of the electrode is fabricated from materials, such as aluminum or pyrolytic graphite. These materials and the work needed to fashion electrode shapes needed to support samples of diverse sizes and shapes cost far less than the same structure fashioned from polycrystalline silicon. The aluminum or graphite electrodes are then lightly coated with an organosilicon polymer cast from solvent. There are a number of commercially available preparations of organosilicon polymers. One example is SHC1010*, manufactured by the General Electric Company. This silicon bearing compound provides the chemically reactive surface needed to provide area uniformity when reactive ion etching materials with active fluoride ion. Very little organosilicon material is used to coat the...