Browse Prior Art Database

Device for Measuring the Vapor Deposition Angle

IP.com Disclosure Number: IPCOM000039242D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-01
Document File: 2 page(s) / 37K

Publishing Venue

IBM

Related People

Bordt, H: AUTHOR [+3]

Abstract

The vapor deposition angle, which is an essential parameter for lift- off metallization, has so far been assessed from the geometry of the deposition equipment. The subsequently described device permits determining the actual (Image Omitted) vapor deposition angle. The device substantially consists of two diaphragms arranged at a spacing A, a pinhole diaphragm with a defined diameter D and a center diaphragm. This device along with a sample wafer is inserted in a wafer position on the dome of the vapor deposition equipment. During vapor deposition, the vapor beam impinges through pinhole diaphragm 1 on wafer 3 (Figs. 1 and 3). Center beam 2 is positioned in the wafer plane, blocking a quarter of the vapor beam such that the center 4 of pinhole diaphragm 1 and the x- and y-directions are marked.

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Device for Measuring the Vapor Deposition Angle

The vapor deposition angle, which is an essential parameter for lift- off metallization, has so far been assessed from the geometry of the deposition equipment. The subsequently described device permits determining the actual

(Image Omitted)

vapor deposition angle. The device substantially consists of two diaphragms arranged at a spacing A, a pinhole diaphragm with a defined diameter D and a center diaphragm. This device along with a sample wafer is inserted in a wafer position on the dome of the vapor deposition equipment. During vapor deposition, the vapor beam impinges through pinhole diaphragm 1 on wafer 3 (Figs. 1 and 3). Center beam 2 is positioned in the wafer plane, blocking a quarter of the vapor beam such that the center 4 of pinhole diaphragm 1 and the x- and y-directions are marked. This permits determining the vapor deposition angle absolutely reliably. For determining the vapor deposition angle, the following values are relevant: pinhole diameter D diaphragm spacing A

measurand x and y, respectively (see Fig. 2)

by means of which the equations are obtained for the angle in the respective axial directions. The vapor deposition angle can thus be determined in two axes, since x- and y-deviations are measurable. This also permits determining dissymmetries, for example, in peripheral regions.

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