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Browse Prior Art Database

Improved Resistor Personality for Use in Masterslices

IP.com Disclosure Number: IPCOM000039460D
Original Publication Date: 1987-Jun-01
Included in the Prior Art Database: 2005-Feb-01
Document File: 2 page(s) / 30K

Publishing Venue

IBM

Related People

Hedman, RL: AUTHOR [+3]

Abstract

Bipolar semicustoms (masterslices) design processes using self-aligning emitters usually include a precision resistor implant as a personality level. This implant is included as part of the personality because it can be better controlled if done after most hot process steps. In the past, an area of the semicustom background image had to be allocated exclusively for this implant. By placing a high value implant resistor from the background processing (e.g., 4 kohm/square) in the locations normally allocated for the precision personality implant resistors, lower accuracy high value resistors can be obtained. If at the precision resistor personality level, a low value implant (e.g., 500 ohm/square) is placed over the high value implant, a low value precision resistor can be obtained.

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Improved Resistor Personality for Use in Masterslices

Bipolar semicustoms (masterslices) design processes using self-aligning emitters usually include a precision resistor implant as a personality level. This implant is included as part of the personality because it can be better controlled if done after most hot process steps. In the past, an area of the semicustom background image had to be allocated exclusively for this implant. By placing a high value implant resistor from the background processing (e.g., 4 kohm/square) in the locations normally allocated for the precision personality implant resistors, lower accuracy high value resistors can be obtained. If at the precision resistor personality level, a low value implant (e.g., 500 ohm/square) is placed over the high value implant, a low value precision resistor can be obtained. Since the precision implant is of significantly higher concentration, it dominates the resistor characteristics including tracking and temperature coefficient. Thus, a given semicustom (masterslice) chip silicon can be more efficiently utilized by allowing all the resistor bar background locations to cover the full design range of implant values. A background cell (macro) can now be used to more efficiently build both low and high power analog or digital circuits. Some designs normally requiring custom backgrounds can now save a significant amount of design and process time by being able to utilize semicustom chips. The following ill...