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Diagnostic Screening of Biological Specimens for Microscopy

IP.com Disclosure Number: IPCOM000039815D
Original Publication Date: 1987-Aug-01
Included in the Prior Art Database: 2005-Feb-01
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Brady, MJ: AUTHOR [+3]

Abstract

X-ray microscopy of biological objects requires extensive processing in order to obtain a relief structure in X-ray resists, such as PMMA. Once the relief structure is obtained, a Scanning Electron Microscope (SEM) produces a magnified picture of the resist relief image. The amount of time required in processing, from start to finish, is often wasted due to the inability of the specimen to selectively absorb the X-rays, or due to incorrect exposure times, and at no point in the process is the probability of success indicated. A way is described for implementing a diagnostic or screening technique that reduces or eliminates the processing time required on specimens that will not deliver the required structure.

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Diagnostic Screening of Biological Specimens for Microscopy

X-ray microscopy of biological objects requires extensive processing in order to obtain a relief structure in X-ray resists, such as PMMA. Once the relief structure is obtained, a Scanning Electron Microscope (SEM) produces a magnified picture of the resist relief image. The amount of time required in processing, from start to finish, is often wasted due to the inability of the specimen to selectively absorb the X-rays, or due to incorrect exposure times, and at no point in the process is the probability of success indicated. A way is described for implementing a diagnostic or screening technique that reduces or eliminates the processing time required on specimens that will not deliver the required structure. Probimide 300 series (337 and 348) a resist product of Ciba-Giegy, is normally developed by a wet develop step, following exposure to ultra-violet (UV) radiation. However, upon exposure, this photosensitive polyimide can be developed by thermal heating to generate a relief image which is thermally stable up to temperatures on the order of 330 to 350 degrees C. TECHNIQUE 1)Spin the photosensitive polyimide onto a carrier substrate. 2) Pre-bake at 85o C for 1 hour in air. 3) Expose. 4) Post-bake at 225o C for 1 hour in air. Step 3 (expose) normally implies UV exposure; however, it has been discovered that relief images can be generated by X-ray exposure to A1-K a radiation (g = 8.3 angstroms) with gra...