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Servo-Controlled Photoresist Dipcoating

IP.com Disclosure Number: IPCOM000039840D
Original Publication Date: 1987-Aug-01
Included in the Prior Art Database: 2005-Feb-01
Document File: 2 page(s) / 31K

Publishing Venue

IBM

Related People

Kin, CC: AUTHOR [+2]

Abstract

A method has been proposed for obtaining a uniform photoresist coating of metal masks used in semiconductor manufacturing processes. The proposal suggests varying the speed at which the mask is withdrawn when dipcoating takes place. An alternative is the draining of the photoresist solution at a variable rate. In dip coating of flat surfaces, such as a metal mask for photoresist processing, when the item being coated is withdrawn from the solution, it is difficult to obtain a uniform thickness of the coating over the entire surface. This proposal suggests that a programmable servo controlled mechanism 1 (Fig. 1) be used to withdraw the metal mask 2 out of the photoresist tank 3 at a variable speed. The speed would be such that a uniform coating would result on the mask.

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Servo-Controlled Photoresist Dipcoating

A method has been proposed for obtaining a uniform photoresist coating of metal masks used in semiconductor manufacturing processes. The proposal suggests varying the speed at which the mask is withdrawn when dipcoating takes place. An alternative is the draining of the photoresist solution at a variable rate. In dip coating of flat surfaces, such as a metal mask for photoresist processing, when the item being coated is withdrawn from the solution, it is difficult to obtain a uniform thickness of the coating over the entire surface. This proposal suggests that a programmable servo controlled mechanism 1 (Fig. 1) be used to withdraw the metal mask 2 out of the photoresist tank 3 at a variable speed. The speed would be such that a uniform coating would result on the mask. An alternative method would function to drain the photoresist 4 (Fig. 2) out of the tank 3 at a variable rate by using either a servo valve controller 5 to control a proportional valve or a pump controller 7 to actuate a pump 8. In either case the photoresist would be drained at a programmed variable rate into a reservoir
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