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Scheme for Proximity Correcting Repetitive Design Features

IP.com Disclosure Number: IPCOM000040341D
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 2 page(s) / 39K

Publishing Venue

IBM

Related People

Rudert, JR: AUTHOR

Abstract

This data compaction method for an electron beam system provides proximity correction changes as part of the referencing data. With this method, a greater volume of the chip pattern description can still be compacted for all cases. In semiconductor processing, data volume to describe chips is becoming large and difficult to manage. One method for data reduction uses the approach that repeating cells need be specified only once. They are then simply referred to, or called, each time they are used in an integrated circuit design. In such cases, both the dose and the geometry must be identical. However, this compaction scheme has limitations in that it cannot be used if proximity corrections are used. This is because the dose will be different in general for each placement of a book or macro.

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Scheme for Proximity Correcting Repetitive Design Features

This data compaction method for an electron beam system provides proximity correction changes as part of the referencing data. With this method, a greater volume of the chip pattern description can still be compacted for all cases. In semiconductor processing, data volume to describe chips is becoming large and difficult to manage. One method for data reduction uses the approach that repeating cells need be specified only once. They are then simply referred to, or called, each time they are used in an integrated circuit design. In such cases, both the dose and the geometry must be identical. However, this compaction scheme has limitations in that it cannot be used if proximity corrections are used. This is because the dose will be different in general for each placement of a book or macro. This method permits the use of books and macros without the restriction of identical proximity corrections for each use of a particular book or macro. This allows logic designs to be compacted. The byte specifying the dose for "exterior" rectangles of a book or macro is made part of the main line pattern and is merged into the geometrical data at writing time. This effectively separates the geometry from the dose for that part of the book or macro which is affected by shapes outside of itself. Compaction is preserved because only one byte per shape is needed to specify dose while 7 bytes are needed for geometry. This me...