Browse Prior Art Database

Ferris Wheel Wafer Loader

IP.com Disclosure Number: IPCOM000040671D
Original Publication Date: 1987-Dec-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 2 page(s) / 56K

Publishing Venue

IBM

Related People

Folchi, GA: AUTHOR

Abstract

A technique is described whereby a four-platform ferris wheel loader provides the mechanism for automatically holding semiconductor wafers inside an electron beam chamber during processing. The concept is an improvement over prior manual loading techniques in that the ferris wheel approach enables automatic position loading of wafers to be processed. The ferris wheel wafer loader is designed to provide a holding platform for silicon wafers while in an E-beam chamber. Wafers are loaded onto platforms 10, 11, 12 and 13, as shown in the figure, prior to evacuating the chamber. The platforms are mounted onto wheels 14 and 15, which are so designed so that the platforms will always be horizontal as the ferris wheel is rotated.

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Ferris Wheel Wafer Loader

A technique is described whereby a four-platform ferris wheel loader provides the mechanism for automatically holding semiconductor wafers inside an electron beam chamber during processing. The concept is an improvement over prior manual loading techniques in that the ferris wheel approach enables automatic position loading of wafers to be processed. The ferris wheel wafer loader is designed to provide a holding platform for silicon wafers while in an E-beam chamber. Wafers are loaded onto platforms 10, 11, 12 and 13, as shown in the figure, prior to evacuating the chamber. The platforms are mounted onto wheels 14 and 15, which are so designed so that the platforms will always be horizontal as the ferris wheel is rotated. Wafers and their holders 16 are first positioned manually onto the platforms utilizing positioning studs 17. After closing and sealing the chamber containing the ferris wheel loader, the chamber is evacuated. A linear loader mechanism (not shown) will then retrieve wafer 16 from platform 10 to be processed by an etching mechanism (not shown) inside the chamber. After completion of the etching process, the linear loader returns wafer 16 to platform 10. Chain drive 18, attached to crossover shaft mechanism 19, will cause the platforms to rotate, such that platform 16 is now in the required horizontal position for the linear loader to retrieve the wafer for processing. The platforms are mounted at their diagonal corners by...