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Electrical Measurement of Dimensions of Isolated Patterns

IP.com Disclosure Number: IPCOM000040783D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Lin, BJ: AUTHOR

Abstract

Isolated patterns of metal removed from a thin metal film change electrical resistance of the metal film by predictable and measureable amounts. A four point probe measurement of a metal film containing such patterns is described for fast, ac- curate dimensional assessment.

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Electrical Measurement of Dimensions of Isolated Patterns

Isolated patterns of metal removed from a thin metal film change electrical resistance of the metal film by predictable and measureable amounts. A four point probe measurement of a metal film containing such patterns is described for fast, ac- curate dimensional assessment.

As shown in the figure, isolated patterns of voids are created in a metal film F, in this case rectangles w1 wide by w2 high. Current I is passed along a horizontal dimension of film F and voltage V is measured across two points as shown. Resistance R of the metal film between the two voltage contacts is thus measured by R = V/I. When the voids pattern substantially alters the current carrying cross-section of the film from that of a void-free film (which may also be present as a test pattern), resistance R is similarly substantially altered. Small changes from nominal in the height w2 are especially detected with the pattern oriented as shown.

Various orientations of the void pattern and of the four point measuring film pattern assist in determination of void dimensions and causes of void dimension variations.

Initial calibration of resistance measurement relationship to dimensions of the void patterns may, in the case of simple geometric shapes, be predicted analytically. Correlation of void dimensions made by scanning electron microscopy with resistance measurements has application to a wider variety of void patterns.

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