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Aqueous-Base Developable Positive Resist Compositions

IP.com Disclosure Number: IPCOM000040798D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Ito, H: AUTHOR

Abstract

Onium salts such as triphenylsulfonium hexafluoroantimonate inhibit dissolution of novolac resins in aqueous base. The two-component resist film is rendered more soluble in aqueous base upon radiation, thereby providing positive-tone image of the mask.

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Aqueous-Base Developable Positive Resist Compositions

Onium salts such as triphenylsulfonium hexafluoroantimonate inhibit dissolution of novolac resins in aqueous base. The two-component resist film is rendered more soluble in aqueous base upon radiation, thereby providing positive-tone image of the mask.

The system allows addition of a third component. For example, polyphthalaldehyde (PPA) incorporated in a small quantity (ca. 5 wt% to the matrix resin) as a third component is completely reverted to phthalaldehyde monomer by reaction with a radiochemically generated acid, and the phthalaldehyde monomer produced in the exposed areas evaporates out of the film upon postbake, thereby recovering the base-solubility of the matrix resin, while PPA in the unexposed areas functions as a polymeric dissolution inhibitor. Other polymeric materials that change the polarity of repeating units through deprotection reaction catalyzed by radiochemically generated acids can also be utilized as a third component, dissolution inhibitor. The addition of a third component to the onium salt/phenolic resin system can provide higher sensitivity and wider process latitude.

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