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Residual Photoresist Measured by Fluorescence Analysis

IP.com Disclosure Number: IPCOM000041001D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Gianopulos, WA: AUTHOR [+2]

Abstract

Quantitative measurement of residual photoresist is facilitate by means of the addition of an azo-dye to photoresist and mea- surement by fluorescence analysis.

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Residual Photoresist Measured by Fluorescence Analysis

Quantitative measurement of residual photoresist is facilitate by means of the addition of an azo-dye to photoresist and mea- surement by fluorescence analysis.

Small amounts of photoresist remaining on a test substrate must be quantitatively measured for several reasons, e.g., completeness of development removal or residual remaining after adhesion pull-off testing. To facilitate the quantitative measurement of this residual photoresist, a known small amount of an azo-dye is added to the photoresist prior to its application to a test substrate. After testing, which generally results in removal of most of the photoresist, a suitable solvent is used to elute remaining photoresist from the test substrate. Intensity of fluorescent radiation from the azo-dye thus dissolved is measured to determine the amount of photoresist residual on the test substrate.

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