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Roughened Protective Overcoats for Thin Film Magnetic Recording Disks Through the Use of Plasma Enhanced Chemical Vapor Deposition

IP.com Disclosure Number: IPCOM000041032D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Novotny, VJ: AUTHOR

Abstract

In the manufacture of thin film metal alloy or metal oxide magnetic recording disks, a protective overcoat is required to be deposited over the magnetic layer to prevent corrosion and mechanical damage to the magnetic layer and to provide lubricity for the air-bearing slider which supports the read/write head. However, if the overcoat is too smooth, the slider can "stick" to the disk which can result in damage to the head or disk during start-up of the disk file.

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Roughened Protective Overcoats for Thin Film Magnetic Recording Disks Through the Use of Plasma Enhanced Chemical Vapor Deposition

In the manufacture of thin film metal alloy or metal oxide magnetic recording disks, a protective overcoat is required to be deposited over the magnetic layer to prevent corrosion and mechanical damage to the magnetic layer and to provide lubricity for the air-bearing slider which supports the read/write head. However, if the overcoat is too smooth, the slider can "stick" to the disk which can result in damage to the head or disk during start-up of the disk file.

This stiction can be reduced by depositing a roughened protective overcoat through the use of plasma-enhanced chemical vapor deposition. In this process a film of protective material, such as silicon dioxide, silicon carbide, silicon nitride or carbon are deposited by chemical vapor deposition to provide an initial smooth base layer, after which the radio frequency (RF) power is varied or modulated, either through a repetitive fre- quency cycle or by on/off pulses to provide a final overcoat layer which has a roughened surface. The amount of roughness in the final layer of the overcoat is a function of the duration of the RF pulses or the frequency range over which the RF power is cycled.

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